富士通研究所最近发明了一种完全自动的激光光束扫描型的光刻掩模检查法。这种方法是采用激光光束在光刻掩模上进行扫描。只要光刻掩模有缺陷,就会从缺陷处产生紊乱的拆射光,并在布郎管上显示出缺陷的位置。在实验中采用此法能够发现甚至1微米左右的缺陷。此法据说具有完全实用的特点。该研究所正在研究将这种方法用于集成 Fujitsu Laboratories recently invented a fully automated laser beam scanning lithography mask inspection method. This method uses a laser beam to scan over a photolithographic mask. As long as the photolithographic mask has a defect, a disorganized demolished light will be generated from the defect and the location of the defect will be shown on the Burang tube. In this experiment can be used to find even 1 micron defect. This law is said to have a completely functional characteristics. The institute is studying the use of this method for integration