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本文用测量电阻变化的方法,研究了Al-Si(1%)金属化线条的电迁移失效.通过不同温度、电流密度应力的加速试验,得到了在所用应力范围内Al-Si(1%)合金电迁移的两个重要参量值:电流密度指数n 和电迁移激活能Q;并用扫描电镜对失效样品进行了观察和对实验结果作了初步的分析讨论.
In this paper, the electromigration failure of Al-Si (1%) metallization lines was investigated by means of measuring the change of resistance. The Al-Si (1% The two important parameters of the electromigration of the alloy: the current density index n and the electromigration activation energy Q; the failure samples were observed by scanning electron microscopy and the experimental results were preliminary analyzed and discussed.