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以水稻(Oryza sativa L.)为试验材料,采用叶面喷施K2SiO3的方法,研究了不同浓度硅处理对盐胁迫下水稻幼苗叶片保护酶活性及离子吸收的影响。结果表明,盐胁迫下水稻叶片SOD、POD活性均显著降低,MDA含量显著提高,喷施1.0～2.0 mmol/L K2SiO3处理显著提高了水稻叶片SOD和POD活性,降低了MDA含量,减轻了盐胁迫下叶片膜脂过氧化程度。盐胁迫显著降低了地上和地下部分对K+、Ca2+、Mg2+的吸收,增加了对Na+的吸收,1.5～2.5 mmol/L K2SiO3处理可显著增加水稻幼苗地上、地下部分K+、Ca2+、Mg2+的积累,降低Na+的积累。硅处理的最佳浓度为1.5 mmol/L。另外,叶面喷施硅后,水稻茎秆中SiO2的含量提高了,茎秆的抗倒伏能力增强。
Rice (Oryza sativa L.) was used as test material and K2SiO3 was sprayed on the leaves to study the effects of different concentrations of silicon on protective enzyme activities and ion uptake by rice seedlings under salt stress. The results showed that under salt stress, the activities of SOD and POD in rice leaves decreased significantly and the content of MDA increased significantly. Spraying 1.0-2.0 mmol / L K2SiO3 significantly increased the activity of SOD and POD in rice leaves, decreased the content of MDA and reduced the salt stress Under the leaf membrane lipid peroxidation level. Salt stress significantly reduced the uptake of K +, Ca2 + and Mg2 + by aboveground and underground parts and increased Na + uptake. 1.5-2.5 mmol / L K2SiO3 treatment significantly increased the accumulation of K +, Ca2 + and Mg2 + in above and below ground parts of rice seedlings, Reduce the accumulation of Na +. The optimum concentration of silicon is 1.5 mmol / L. In addition, after the foliar application of silicon, the content of SiO2 in the rice stem increased, and the lodging resistance of the stem increased.