【摘 要】
：
利用原子力显微镜 (AFM)和椭圆偏振仪研究了溅射条件对纳米 Al薄膜性能的影响。研究表明 ,随溅射 Ar气压的增大 ,纳米 Al膜的表面粗糙度增加 ,折射率降低 ,反射率减小 ,这与
【机 构】
：
中国科学院上海光学精密机械研究所,中国科学院上海光学精密机械研究所,中国科学院上海光学精密机械研究所 上海201800,上海201800,上海201800
论文部分内容阅读
利用原子力显微镜 (AFM)和椭圆偏振仪研究了溅射条件对纳米 Al薄膜性能的影响。研究表明 ,随溅射 Ar气压的增大 ,纳米 Al膜的表面粗糙度增加 ,折射率降低 ,反射率减小 ,这与薄膜的结构变化密切相关 ;随溅射功率的增大 ,纳米 Al膜的表面粗糙度增加 ,而其光学常数的变化则不明显。
The effects of sputtering conditions on the properties of nano-Al films were investigated by atomic force microscopy (AFM) and ellipsometry. The results show that with the increase of sputtering pressure, the surface roughness of nano-Al films increases, the refractive index decreases and the reflectivity decreases, which is closely related to the structural changes of the films. With the increase of sputtering power, the nano Al films Of the surface roughness increases, while the optical constant changes are not obvious.
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