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采用HPM溶液(盐酸、双氧水和去离子水的混合液)结合氧等离子体对多层介质膜脉宽压缩光栅进行清洗研究。用X射线光电子能谱检测光栅表面的元素成分及其原子含量的变化。实验结果表明,氧等离子体处理能有效去除光栅表面残留光刻胶和碳氟化合物;再经HPM溶液清洗,反应离子束刻蚀和氧等离子体处理过程产生的金属污染物被进一步去除。经过上述清洗工艺处理后,光栅一级衍射效率仍保持在95%以上,光栅表面激光诱导损伤阈值达到1.6J/cm2(1053nm,10ps)。实验结果说明了氧等离子体和HPM溶液相结合能有效清洗多层介质膜脉宽压缩光栅,并显著提高光栅损伤阈值。
HPM solution (hydrochloric acid, hydrogen peroxide and deionized water mixture) combined with oxygen plasma multilayer dielectric film pulse width compression grating cleaning research. X - ray photoelectron spectroscopy was used to detect the elemental composition and the atomic content of the gratings. The experimental results show that the oxygen plasma treatment can effectively remove the residual photoresist and fluorocarbons on the surface of the grating, and then the metal contaminants generated by HPM solution cleaning, reactive ion beam etching and oxygen plasma treatment are further removed. After the above cleaning process, the grating first-order diffraction efficiency remained above 95%, and the laser-induced damage threshold of the grating surface reached 1.6J / cm2 (1053nm, 10ps). The experimental results show that the combination of oxygen plasma and HPM solution can effectively clean the multi-layer dielectric film pulse width compression grating and significantly increase the grating damage threshold.