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东京应用化学工业公司,已经研制成功了超大规模集成电路生产中起重要作用的微细加工所必须的正性光致抗蚀剂——“OFPR-800”,并且大量在市场上销售。 过去,大都使用负性光致抗蚀剂,但由于在接触曝光时,对掩模本身有损伤及造成污染等,所以,只能分辨4～5微米的图形。因此,分辨率良好的正性光致抗蚀剂就逐渐引人注目。但由于其先致抗蚀剂内树脂容易被破坏,还缺乏耐干式付蚀等,所以至今尚未真正达到完全实用化。因而,本公司最近解决了这个难题,研制成功了新的超大规模集成电路制作中应用的正性光致抗蚀剂,并达到了实用化。 这种光致抗蚀剂是在树脂、溶液等组分方面下了很大功夫,是一种全新的感光
Tokyo Chemical Industry Co., Ltd. has successfully developed OFPR-800, a positive photoresist necessary for microfabrication that plays an important role in the production of very large-scale integrated circuits, and is commercially available in large quantities. In the past, the negative photoresist was mostly used. However, since the mask itself is damaged and contaminated during contact exposure, only 4 to 5 μm patterns can be resolved. As a result, positive photoresists with good resolution gradually attract attention. However, due to its first resist resin is easily destroyed, but also the lack of dry-type corrosion, so it has not really reached full practical. As a result, the company recently solved this problem and developed a new type of positive photoresist for use in fabrication of very large scale integrated circuits. This photoresist is in the resin, solution and other components under a lot of effort, is a new kind of light