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以正硅酸乙酯 (TEOS)为有机醇盐前驱体 ,采用溶胶 凝胶技术 ,通过控制制备条件 ,结合三甲基氯硅烷 (TMCS)对SiO2 胶粒表面的修饰过程 ,制备出折射率可调的疏水型SiO2 薄膜。对薄膜采用了不同的后处理方式 ,研究了氨和水蒸气混合气体热处理技术对薄膜疏水性能的影响。采用椭偏仪、FTIR和接触角测试仪对薄膜的折射率、红外特性、接触角等的测试研究表明 :疏水型SiO2 薄膜的折射率可在1 3 5～ 1 2 0之间连续可调 ,与传统热处理相比 ,混合气氛热处理使薄膜的折射率略有增加 ,在所研究的范围内折射率平均增加 0 0 2左右 ;SiO2 胶粒表面的亲水性OH基团可基本被非活性CH3 基团代替 ,薄膜的疏水能力得到进一步提高 ;接触角由未作表面修饰时的 40°左右增加到表面修饰并结合混合气氛热处理的 13 7°左右
Using tetraethoxysilane (TEOS) as precursor of organic alkoxide, sol-gel technique was used to control the preparation conditions and the modification process of SiO2 micelles by trimethylchlorosilane (TMCS) Adjustable hydrophobic SiO2 film. Different post-treatment methods were used to study the influence of heat treatment of ammonia and water vapor on the hydrophobic properties of the films. Using ellipsometer, FTIR and contact angle tester for the refractive index of the film, infrared properties, contact angle test results show that: the hydrophobic SiO2 film refractive index can be continuously adjustable between 1 35 ~ 120, Compared with the conventional heat treatment, the refractive index of the film increased slightly by the heat treatment in the mixed atmosphere, and the average refractive index increased by about 0 0 2 within the range studied. The hydrophilic OH groups on the surface of the SiO2 micelles can be basically replaced by the inactive CH3 Group instead of the hydrophobic ability of the film to be further improved; contact angle from the surface modification without 40 ° increased to surface modification combined with the mixed atmosphere heat treatment of about 13 7 °