随着集成电路器件微细化的进展,采用电子束作图装置就越来越显得必要了。这种装置以往用来制作集成电路图形原版的掩模和一次版,其微细性和高精度已被人们所重视。最近,它作为直接在圆片上曝光制作集成电路图形的装置,与QTAT以及尖端器件的一部分微细图形加工用的装置——缩小投影曝光装置等混合使用了。为了探讨电子 As the miniaturization of integrated circuit devices progresses, the use of electron beam mapping devices becomes more and more necessary. This device used to make the original version of the integrated circuit graphics mask and the first edition, its fineness and high precision has been people attention. Recently, it has been used as a device for directly producing an integrated circuit pattern on a wafer, in combination with a QTAT and a part of a fine pattern processing device for a cutting edge device, a reduction projection exposure apparatus, and the like. To explore electronics