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负离子源是应串列加速器的需要而产生的。目前在串列加速器上基本上使用三种形式的负离子源——双等源、电荷交换源和溅射源。双等源在产生束流品质较好的气体负离子方面有特殊的优点。它能产生多种气体负离子,如氢、氘、碳、氮、氧、氟等,而且束流较大,发射度较小。如通用离子源公司的358型双等源,能给出最大的氢负离子流约150μA,发射度约3～6mm·mrad·MeV~(1/2)。电荷交换源也不可缺少,目前它是产生氦负离子的唯一离子源。通用离子源公司生产的710锂电荷交换源能保证4μA的氦负离子,2μA的锂负离子。溅
Negative ion source is generated by the need of tandem accelerator. Currently three types of negative ion sources are basically used on tandem accelerators - double sources, charge exchange sources and sputtering sources. The double source has special advantages in producing gas anion with good beam quality. It can produce a variety of gas anions, such as hydrogen, deuterium, carbon, nitrogen, oxygen, fluorine, etc., and the larger beam, less emission. Such as General Ion Source 358-type dual source, can give the largest hydrogen anion current of about 150μA, the emission of about 3 ~ 6mm · mrad · MeV ~ (1/2). Charge exchange sources are also indispensable, and it is the only ion source that generates helium anions currently. 710 Lithium Ion Exchanger from General Ion Sources guarantees 4μA of helium anion and 2μA of lithium anion. splash