论文部分内容阅读
对不同拉拔变形程度及不同温度退火后的钽丝织构， 借助极图与现代ＯＤＦ 分析术进行了研究。结果表明钽丝的拉拔织构主要聚集在α取向线上，形成〈１１０〉丝织构，织构组分主要有｛４４１｝〈１１０〉，｛３３２｝〈１１０〉，｛３３４｝〈１１０〉及｛１１５｝〈１１０〉。丝织构的形成与发展的主要特征可用｛１１０｝〈１１１〉位错滑移和轴对称变形的Ｔａｙｌｏｒ 完全限制模型进行解释。两种不同减面率的钽丝具有明显不同的退火织构组分。７７ ％ 冷拉减面率的钽丝退火后具有与拉拔丝基本相同的织构组分， 钽丝发生了原位再结晶。９０ ％ 冷拉减面率的钽丝低温退火后产生同样的效果， 然而经高温退火后出现新的织构组分｛１１１｝〈１１０〉和｛１１１｝〈１１２〉随退火温度的升高而增强， 其形成由定向长大机制控制。
For different degree of drawing deformation and different temperature annealed tantalum wire texture, with polar diagram and modern ODF analysis were studied. The results show that the drawing texture of tantalum wire mainly concentrates on the αorientation line and forms the <110> silk texture. The texture components include {441} <110>, {332} <110>, {334} 110> and {115} <110>. The main features of the formation and development of silk textures can be explained by Taylor’s complete constrained model of {110} <111> dislocation slip and axisymmetric deformation. Two different reduction rates of tantalum wire have significantly different annealed texture components. 77% cold-drawn reduction rate of tantalum wire annealed with drawing wire with the same texture components, tantalum wire in situ recrystallization. The same effect was observed after low temperature annealing of 90% cold-drawn reduction tantalum wire. However, the higher texture annealing temperatures {111} <110> and {111} <112> Enhance its formation by the orientation of the mechanism of growth and control.