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本文研究BMIPF6离子液体中Au(111)和Pt(111)表面Ge的电沉积行为.循环伏安法测试结果表明,在含0.1 mol·L-1GeCl4的BMIPF6溶液Au(111)和Pt(111)表面均有两个与Ge沉积过程相关的还原峰.第一个还原峰包含了Ge4+还原成Ge2+及Ge的欠电位沉积,第二个还原峰对应Ge的本体沉积.现场扫描隧道显微镜研究结果表明,Ge在Au(111)和Pt(111)表面均有两层欠电位沉积.第一层欠电位沉积厚度平均约为0.25 nm、形貌平整、带有缝隙的亚单层结构.第二层欠电位沉积形貌相对粗糙的点状团簇结构.该欠电位沉积过程伴随表面合金化.
In this paper, the electrodeposition of Ge on Au (111) and Pt (111) surfaces in BMIPF6 ionic liquid was investigated. The results of cyclic voltammetry showed that Au (111) and Pt There are two reduction peaks associated with Ge deposition on the surface.The first reduction peak contains the under-potential deposition of Ge4 + reduced to Ge2 + and Ge, and the second reduction peak corresponds to the bulk deposition of Ge.The field scanning tunneling microscopy results show that , Ge has two underpotential depositions on the surface of Au (111) and Pt (111), the average thickness of the underpotential deposition in the first layer is about 0.25 nm, the morphology is smooth, and the sub-monolayer structure with gaps is formed. Underpotential deposition morphology is relatively rough dot-like cluster structure.The underpotential deposition process is accompanied by surface alloying.