论文部分内容阅读
对经过空气中300℃、400℃氧化及氧化后氟化的N6δ4镍金相抛光样品进行了AES及ESCA剖面分析。结果表明,上述氧化生成的NiO膜,其氟化过程分两步进行:(1)氟夺取Ni~(2+)的电子生成NiF_2及Ni_2O_3,(2)Ni_2O_3与氟反应生成NiF_2及O_2;推测NiO膜的氟化过程为氟通过气-固界面向内扩散并取代氧的过程。
The AES and ESCA profiles of N6δ4 nickel metallized samples polished by oxidation and oxidation at 300 ℃ and 400 ℃ in air were analyzed. The results show that the fluorination process of NiO film is oxidized into NiF_2 and Ni_2O_3, and (2) Ni_2O_3 reacts with fluorine to form NiF_2 and O_2. The fluorination of NiO film is the process of fluorine diffusing inwardly and replacing oxygen through the gas-solid interface.