超大规模集成电路与大规模集成电路在结构及工艺方面没有多大差别,即使在制造技术上超大规模集成电路部分地采用了电子束曝光及干法工艺等新技术,但在制作方式上与大规模集成电路基本上没有什么不同。因此,在超大规模集成电路制作工艺过程中,所使用的净化间方面并不一定会出现特别新的问题,它与目前大规模集成电路制作工艺过程中所使用的净化间 Large scale integrated circuits and large scale integrated circuits in terms of structure and technology is not much difference, even in the manufacturing technology of VLSI partially adopted by the electron beam exposure and dry technology and other new technologies, but in terms of production methods and large-scale The integrated circuit is basically no different. Therefore, there is not necessarily a special new problem in the purification room to be used in the manufacturing process of the VLSI circuit. This is not in line with the current situation in the purification room used in the process of manufacturing large scale integrated circuits.