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用X射线光电子能谱 (XPS)对自制ZrO2 薄膜进行了成分分析 .结果发现 ,在基片有负偏压的条件下 ,薄膜发生了氧缺位现象 ,退火处理可以补偿氧缺位 .在膜表面存在一个Y的偏聚层 .分析和讨论了这些现象产生的原因
The composition of self-made ZrO2 thin films was analyzed by X-ray photoelectron spectroscopy (XPS) .It was found that oxygen vacancies occurred in the films under negative bias conditions and the oxygen vacancies could be compensated by annealing treatment. There is a segregation layer of Y on the surface.The causes of these phenomena are analyzed and discussed