本文从先进的高封装密度微电子器件制造者的需要出发,描述了一种新的照相材料及其有关的工艺过程的实验工作。对接触复印的微照相过程(包括负复印工艺和正复印工艺)进行了实用的说明。新的照相工艺能准确控制微相原始尺寸的能力对确定所设计器件的几何形状有着重大的意义。 Based on the needs of advanced packaging density microelectronic device manufacturers, this paper describes a new photographic material and its related experimental work. The photographic process of contact copying, including the negative copy process and the positive copy process, is illustrated in practical terms. The ability of the new photographic process to accurately control the original size of the micro-phase is of great importance in determining the geometry of the device being designed.