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本文在一维LPCVD计算机模拟算式的基础上,考虑到反应管中,径向浓度不均匀的影响,进一步提出三维LPCVD计算机模拟算式,以便同时解决片内和片间均匀性问题.在形式上,整个三维模拟算式可以分解为片内和片间两个独立的部分,但二者是相互影响的.计算结果同一些实验结果具有相同的结论.在三维LPCVD计算机模拟的指导下,我们在研制LPCVD工艺和设备中取得了片内、片间均匀性和批间重复性都极为良好的结果.
Based on the one-dimensional LPCVD computer simulation formula, taking into account the influence of the uneven radial concentration in the reaction tube, a three-dimensional LPCVD computer simulation formula is proposed to solve the problem of in-chip and in-slice uniformity. In terms of form, The whole three-dimensional simulation formula can be decomposed into two independent parts of the chip and the chip, but the two affect each other. The calculation results have the same conclusion with some experimental results. Under the guidance of three-dimensional LPCVD computer simulation, Process and equipment made in-chip, chip-to-chip uniformity and repeatability are very good results.