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本工作建立了高纯水、高纯气(N_2、H_2、O_2、Ar、He);特种气体(硅烷、磷烷、二氧化碳、氯化氢、甲烷)以及硅片,高纯水用的各种树脂、塑料,各种反渗透膜、超过滤膜中阴离子分析方法,对于F~-,Cl~-,NO_3~-,HPO_4~(2-)及SO_4~(2-)检测限分别为0.1,0.05,0.5,0.5,0.1ppb,并建立了半导体工艺废水中NH_4~+、NO_2~-、SO_3~(2-)、Br~-、CN~-和AsO_4~(3-)等离子的分析方法。用自制的小容积、灵敏度高的电导检测器以及自制的大体积定量管,代替了引进件。并改进了检测系统, 增加反压装置,降低了基线噪声,设计并制造了一套膜过滤及溶液吸收联用的气体采样装置,采用一次直接进样,大大提高了检测灵敏度(3倍),降低了检测限,从而首次成功的将这一分离技术应用在半导体工艺中,在国内外首次实现测定≤0.5ppb级超痕量阴离子不采用浓缩柱的技术,建立了快速、灵敏、可靠性强的离子色谱分析的新方法。 目前已为全国85个单位检验各种水质、原材料、气体等。该方法已定为中华人民共和国电子级水国家标准方法的仲裁方法。
In this work, various kinds of resins, such as high purity water, high purity gas (N 2, H 2 O 2, Ar and He), special gases (silane, phosphine, carbon dioxide, hydrogen chloride and methane) Reverse osmosis membrane, ultrafiltration membrane anion analysis method for the detection limit of F ~ -, Cl ~ -, NO_3 ~ -, HPO_4 ~ (2-) and SO_4 ~ (2-) were 0.1,0.05,0.5,0.5, 0.1ppb. The analytical methods of NH_4 ~ +, NO_2 ~ -, SO_3 ~ (2 -), Br ~ -, CN ~ - and AsO_4 ~ (3-) in semiconductor process wastewater were established. With homemade small-volume, high sensitivity of the conductivity detector and homemade large volume tube, instead of the introduction of pieces. The detection system is improved, the back pressure device is added, the baseline noise is reduced, a gas sampling device combining membrane filtration and solution absorption is designed and manufactured. With one direct injection, the detection sensitivity is greatly improved (3 times) Reduce the detection limit, so the first successful application of this separation technology in semiconductor technology, the first time at home and abroad to achieve ≤ 0.5ppb ultra-trace levels of anions do not use concentrated column technology, the establishment of a fast, sensitive and reliable New Method for Ion Chromatography. At present, 85 units nationwide have been tested for various kinds of water quality, raw materials and gases. This method has been set as the People’s Republic of China Electronic Water Standard Methods of arbitration.