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一、概述随着半导体制版工艺、设备不断更新,分步重复照相——精缩中异图分步(或异图插入)应用日渐广泛。常见的异图分步有:工艺监测图形的插入;自动光刻机用以自动对准的自动符号图形的插入等。然而,仅有一块原来制做的必须更改的异图分步掩模版或对应刻出图形的硅片,要求重新制出完全与之配套的掩模版的事是经常发生的。如何才能补做出一块合格的异图分步光刻掩模版来呢?异图分步补版的关键是初缩版的复位校准,复位校准的核心则是要制做一个高精度透明辅助标尺,用它来测量,复位校准补版完全符合要求,补版误差≤0.5μm。
First, an overview With the semiconductor plate making process, equipment is constantly updated, step by step repeat photography - fine shrink in the different steps (or insert) application more widely. The common figure is divided into steps: process monitoring graphics to insert; automatic lithography used to automatically align the insertion of automatic symbol graphics. However, it is not uncommon to have only one separately-manufactured, step-by-step reticle of a different picture or a correspondingly patterned silicon wafer that requires a complete reworking of the reticle. How can we make up a qualified step by step lithography lithography mask to do it? The key to the step-by-step complementary version of the map is reduced version of the first reset calibration, reset the core of the calibration is to make a high-precision transparent auxiliary scale , Use it to measure, reset calibration revision fully meet the requirements, complement error ≤ 0.5μm.