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通过在N2气氛和600℃基体温度下交替溅射Ti和Al靶并通过沉积过程中Ti和Al原子间的互扩散制备了(Ti,Al)N纳米晶薄膜.采用场发射扫描电镜、X射线衍射和纳米压痕技术研究了薄膜的微结构和力学性能.结果表明,(Ti,Al)N膜具有细小、致密和光滑的表面结构.在交替沉积过程中Ti原子会被较小的Al原子取代,形成面心立方结构的(Ti,Al)N薄膜,并存在(200)面择优取向.与TiN薄膜相比,(Ti,Al)N薄膜的晶粒尺寸和晶格常数均有所下降;(Ti,Al)N薄膜的硬度H明显提高,而弹性模量E却稍有降低,其结果使H3/E2比值大幅提高,薄膜的抗塑性变形能力增强.(Ti,Al)N纳米晶薄膜的高性能主要归因于固溶强化机制.
(Ti, Al) N nanocrystalline thin films were prepared by alternately sputtering Ti and Al targets at N2 and 600 ℃ and interdiffusing Ti and Al atoms during the deposition process.Using field emission scanning electron microscopy, X-ray Diffraction and nano-indentation techniques were used to investigate the microstructure and mechanical properties of the films.The results show that the (Ti, Al) N films have a fine, dense and smooth surface structure.The Ti atoms are replaced by the smaller Al atoms , The (Ti, Al) N thin film with face-centered cubic structure is formed, and the preferred orientation of (200) plane exists.The grain size and lattice constant of (Ti, Al) N thin films decrease compared with TiN thin films The hardness H of (Ti, Al) N thin films increased obviously while the elastic modulus E decreased slightly, and the ratio of H3 / E2 greatly increased and the plastic deformation resistance of the films increased. (Ti, Al) N nanocrystals The high performance of the film is mainly due to the solution strengthening mechanism.