Calix[4]resorcinarene, prepared by the acidcatalyzed condensation of resorcinol and paraldehyde, was used as the core of the molecular glass compound. The hydroxyl groups of calix[4]resorcinarene were partly protected by tert-butoxycarbonyl(t-BOC) and then esterified with 2-diazo-1-naphthoquinone-4-sulfonyl chloride(2,1,4-DNQ-Cl). Upon irradiation to 365 nm light, the 2,1,4-DNQ groups undergo photolysis to generate a small quantity of sulfonic acid other than indene carboxylic acid. The generated sulfonic acid can further catalyze the deprotection of the t-BOC group. So, a new type of single-component chemically amplified i-line positive photoresist can be formed by the molecular glass compounds. The lithographic performance of the resist was evaluated with high resolution and photosensitivity with an i-line stepper. Calix [4] resorcinarene, prepared by the acid catalyzed condensation of resorcinol and paraldehyde, was used as the core of the molecular glass compound. The hydroxyl groups of calix [4] resorcinarene were partly protected by tert-butoxycarbonyl (t- BOC) and then esterified with 2-diazo-1-naphthoquinone-4-sulfonyl chloride (2,1,4-DNQ-Cl). Upon irradiation to 365 nm light, the 2,1,4-DNQ groups subjected photolysis to generate a small quantity of The generated sulfonic acid can further catalyzed the deprotection of the t-BOC group. So, a new type of single-component chemically amplified i-line positive photoresist can be formed by the molecular glass compounds. lithographic performance of the resist was evaluated with high resolution and photosensitivity with an i-line stepper.