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本文是介绍一种用自显影抗蚀剂的离子束曝光技术。硝化纤维素受到离子束照射后能够进行自显影,不需要用显影剂进行显影就能够获得高分辨率的曝光图形。介绍了离子束1:1接近式印刷曝光机的工作原理和硝化纤维素抗蚀剂的曝光实验结果。 采用低能离子束对自显影抗蚀剂进行曝光的一个显著优点是:能够获得具有较大纵横比的图形结构。采用5keV的低能锂离子束对3μm厚的硝化纤维素层进行曝光,能够获得最小线宽为0.5μm的高分辨率图形,图形结构的纵横比为6:1。
This article describes a self-developed resist ion beam exposure technology. Nitrocellulose is capable of autoradiography after being irradiated with ion beams, and high-resolution exposure patterns can be obtained without developing with a developer. The working principle of ion beam 1: 1 proximity printing exposure machine and the exposure experiment of nitrocellulose resist are introduced. A significant advantage of exposing a self-developed resist with a low-energy ion beam is that a patterned structure with a large aspect ratio can be obtained. Using a 5 keV low-energy lithium ion beam to expose a 3 μm thick nitrocellulose layer, a high-resolution pattern with a minimum line width of 0.5 μm can be obtained. The aspect ratio of the pattern structure is 6: 1.