随着半导体器件的高集成化和高密度化,对于制造这些器件的工厂及其环境等也提出了进一步全面改善的要求。例如,在净化房间方面,已经要求使用10级乃至1级的净化间,而在支配器件成品率的粒子尺寸方面,甚至直径为0.1μm的粒子都已经会影响成品率了。 As semiconductor devices have become more integrated and highly densified, further improvements have been made to the factories and their environments in which these devices are manufactured. For example, decontamination rooms of Class 10 or even Class 1 have been demanded for decontamination of rooms, and even particles with a diameter of 0.1 μm in controlling the particle size of the device yield have affected the yield.