分别采用真空蒸镀_热氧化(VE_TO)及脉冲激光沉积(PLD)技术制备氧化镍(NiO)阳极薄膜材料,并利用XRD、SEM、循环伏安、充放电等方法对薄膜的结构和电化学性能进行了表征。结果表明,两种方法均制备了厚度均匀、表面光滑、与基片结合紧密、无缺陷、致密的纳米晶形NiO薄膜。采用PLD技术制备的薄膜颗粒更小、结构更有序,具有更高的电化学比容量,并且能承受大电流充放电。因此,这两种方法制备的NiO薄膜可根据充放电电流密度的要求有选择的应用于全固态薄膜锂离子电池中。 Nickel oxide (NiO) anodic thin films were prepared by vacuum evaporation-thermal oxidation (VE_TO) and pulsed laser deposition (PLD) respectively. The structure and electrochemical properties of the films were characterized by XRD, SEM, cyclic voltammetry, Performance was characterized. The results show that the nanocrystalline NiO thin films with uniform thickness, smooth surface, close bond with the substrate, no defect and compactness were prepared by both methods. Thin films prepared by PLD technology have smaller structure, more ordered structure, higher electrochemical specific capacity, and can withstand large current charge and discharge. Therefore, NiO films prepared by these two methods can be selectively applied to all-solid-state thin-film lithium-ion batteries according to the requirements of current density of charge and discharge.