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报道了实验制备条件对纳米多孔SiO2 薄膜结构、折射率、红外吸收、XPS等特性的影响 ,尤其是报道了一种新的快速、方便、有效实现纳米多孔SiO2 薄膜折射率连续调节的方法 .在溶胶 凝胶基础上 ,采用碱、酸一步法以及碱 /酸两步法和浸渍镀膜技术制备了纳米多孔SiO2 薄膜 .使用原子力显微镜、扫描电镜、XPS、傅里叶红外光谱仪、椭偏仪等方法测量和分析了薄膜的特性 .实验结果给出从碱一步法、碱 /酸两步法、到酸一步法形成的薄膜 ,SiO2 颗粒变小 ,孔隙率降低 ,折射率从 1 18连续增加到 1 41;Si2 p峰向高束缚能方向移动 ,并接近块体的值 ;红外吸收光学模ω4 的频率向低波数方向移动 ,揭示了Si O Si键角的不断降低 .这些结果表明 ,碱 /酸两步法能方便、有效地连续控制纳米多孔SiO2 薄膜的结构 ;实验条件对薄膜特性的影响起因于纳米多孔结构改变引起的SiO2 结构变化 .
The effects of experimental preparation conditions on the properties of nano-porous SiO2 films, such as refractive index, infrared absorption and XPS were reported. In particular, a new method for rapid, convenient and effective continuous adjustment of the refractive index of nano-porous SiO2 films was reported Sol-gel method, nano-porous SiO2 thin films were prepared by alkali-acid one-step method and alkali-acid two-step method and impregnation coating technique.Using atomic force microscopy, scanning electron microscopy, XPS, Fourier transform infrared spectroscopy and ellipsometry The properties of the films were measured and analyzed.The experimental results show that the films of SiO2 formed by the one-step alkali-acid-two-step method and one-step acid-base method become smaller and the porosity decreases and the refractive index increases continuously from 1 18 to 1 41; the peak of Si 2 p moves towards the high binding energy and approaches the value of the bulk; the frequency of the infrared absorption modulus ω 4 shifts to the lower wavenumber, revealing the continuous decrease of the Si O Si bond angle.These results show that the base / The two-step method can conveniently and effectively control the structure of the nano-porous SiO2 film. The influence of the experimental conditions on the properties of the film is due to the change of the structure of the nano-porous SiO2 Of.