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采用多靶磁控溅射制备了 Ｗ／ＳｉＣ纳米多层膜。并用 ＸＲＤ和 ＴＥＭ研究了 Ｗ／ＳｉＣ纳米多层膜的微结构。研究表明，Ｗ／ＳｉＣ纳米多层膜的调制结构界面平直、清晰、周期性好；ＳｉＣ调制层为非晶态，Ｗ调制层在大调制周期为纳米晶，并随调制周期减小逐渐转变为非晶态。
W / SiC multilayered films were prepared by multi-target magnetron sputtering. The microstructure of W / SiC multilayered films was investigated by XRD and TEM. The results show that the interface of W / SiC nano-multilayers is flat, clear and periodic. The SiC modulation layer is amorphous. The W modulation layer is nanocrystalline at the large modulation period and gradually changes with the modulation period decreasing Amorphous.