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采用划痕法测定了离子束增强沉积TiN薄膜的界面结合力。结果表明,由于在离子束增强沉积过程中TiN薄膜和基体之间生成一层厚约30~40nm的过渡层,从而大大改善了涂层的界面结合强度,其临界载荷可达140N,为一般PVD和CVD方法所生成的TiN膜的3~4倍,并且发现它并不随膜厚的增加而变化。
The interfacial adhesion of TiN films deposited by ion beam enhanced deposition was measured by scratch test. The results show that the interfacial bonding strength of the coating is greatly improved by the formation of a transition layer with a thickness of about 30-40 nm between the TiN film and the substrate during ion beam enhanced deposition. The critical load can reach 140 N, And 3 ~ 4 times that of the TiN film formed by the CVD method, and found that it does not change with the increase of the film thickness.