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化学气相沉积(CVD)金刚石为多晶材料,其表面多为杂乱分布晶粒的堆积,尤其是金刚石厚膜,其表面堆积的大晶粒显露出明显的棱角,表面相当粗糙.而金刚石膜在电子学等领域的应用要求其表面具有较好的光洁度,以便形成良好的接触表面.同时受到合成工艺条件的影响,使生长的膜在厚度的一致性方面很差,特别是用灯丝热解CVD(HFCVD)和电子增强CVD(EACVD)方法合成的金刚石膜,一般膜厚度的不均匀性在平均厚度的±20%范围内变化(表面积为1cm×1cm).这种表面粗糙厚度不一致的膜不能直接得到应用,否则由于接触和厚度的一致性差而造成的缺陷将完全掩盖金刚石膜在电子学等领域的应用优势,其效果可能比不用金刚石膜还差.因此对金刚石膜表面必须进行抛光以获得较好的光洁度,同时要解决厚度一致性差的问题.
Chemical vapor deposition (CVD) diamond is a polycrystalline material, its surface is mostly the accumulation of disordered grains, especially the diamond thick film, the large grains on the surface of the deposited grains show obvious edges and the surface is quite rough, Electronics and other fields require the surface has a better finish in order to form a good contact surface.At the same time by the synthesis process conditions, the growth of the film in the thickness of the consistency is poor, especially by filament pyrolysis CVD (HFCVD), and electron enhanced CVD (EACVD), generally non-uniformity in film thickness varies within ± 20% of the average thickness (surface area is 1 cm × 1 cm). Such films with inconsistent surface roughness can not Direct application, or because of poor contact and the thickness of the defects caused by defects will completely cover the application of diamond films in electronics and other fields, the effect may be even worse than without the diamond film, the diamond film surface must be polished to obtain Better finish, at the same time to solve the problem of poor consistency of thickness.