本文从对准系统与对准过程、提高型整片对准计算、激光步进对准测量系统、以及激光步进对准探测中对准标记形貌的作用等几个方面，介绍了Ｎｉｋｏｎ公司研制的一种用于光学光刻生产的提高型整片对准技术（ＥＧＡ）。研究结果表明，该技术的生产效率接近标准的整片对准技术，套刻精度达到逐场对准的技术水平 In this paper, several aspects of alignment system and alignment process, improved integral alignment calculation, laser step alignment measurement system, and the role of alignment mark in laser step alignment detection are introduced. Developed for the development of optical lithography monolithic Alignment Technology (EGA). The results show that the production efficiency of the technology is close to the standard whole-chip alignment technology, and the overlay accuracy reaches the field-aligned technology level