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超导涂层导体是解决当今能源危机的一个重要材料,而Ni合金基带是制备高性能涂层导体的基础.本论文将高温固溶后的Ni-5%W基带在磷系抛光液中进行电化学抛光,通过对抛光电流密度和抛光时间的探索,认为0.1~0.12A/cm~2,2~2.5min条件下能够获得非常平整的基带表面,样品的均方根粗糙度RMS=0.889nm.并通过自氧化外延NiO阻隔层进一步验证了抛光的可行性和必要性.为后续涂层的制备打下良好的基础,对制备高性能超导涂层导体具有重要指导意义.
Superconducting coated conductor is an important material to solve today’s energy crisis, and Ni alloy base band is the basis of preparation of high performance coated conductor.In this paper, the Ni-5% W base-band after solution heat treatment in phosphorus-based polishing solution Electrochemical polishing, through the polishing current density and polishing time to explore, that 0.1 ~ 0.12A / cm ~ 2,2 ~ 2.5min conditions can get a very smooth surface of the substrate, the sample root mean square roughness RMS = 0.889nm The feasibility and necessity of polishing were further verified by the self-oxidized epitaxial NiO barrier layer, which laid a good foundation for the preparation of subsequent coatings and provided an important guide for the preparation of high performance superconducting coated conductors.