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大家知道,在微电子器件制作中,光刻技术是关键工艺之一。光刻质量的优劣,直接影响微电子器件的性能和成品率。特别是在微电子工业发展到芯尺面积为5×5毫米、集成度达1800位的今天,光刻技术尤为重要。随着微电子工业的发展,与光刻技术有关的设备、材料、新的工艺也相应地发展。本着毛主席有关“洋为中用”和“知已知彼,百战不殆”的教导,为了便于战斗在微
We all know that in the production of microelectronic devices, lithography is one of the key processes. The pros and cons of lithography quality, a direct impact on the performance and yield of microelectronic devices. Especially in the microelectronics industry to the core ruler area of 5 × 5 mm, the integration of 1800 today, lithography is particularly important. With the development of the microelectronics industry, the equipment, materials and new processes related to lithography have also been developed accordingly. In the light of Chairman Mao’s teaching on “using foreign affairs for middle purposes” and “knowing that we know ourselves and who are able to win overwhelm themselves”, in order to facilitate the fighting,