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高致密、结晶好的钽酸锶铋陶瓷靶由ＳｒＣＯ３、Ｂｉ２Ｏ３和Ｔａ２Ｏ５粉末混合、预烧、压模和烧结而成，预烧和烧结温度范围分别为９００～１０００℃和１０００～１４００℃。用脉冲准分子激光沉积技术制备得到非晶钽酸锶铋薄膜，在氧气氛下经退火得到多晶钽酸锶铋薄膜。ＸＲＤ分析得到钽酸锶铋薄膜择优取向以（００８）和（１１５）为主；ＴＥＭ分析得到钽酸锶铋薄膜晶界清晰、结构致密，平均晶粒大小约为２０ｎｍ，薄膜的界面清晰、陡峭，厚度约为２００ｎｍ。
The high-density and crystalline tantalum bismuth tantalate ceramic target is prepared by mixing SrCO3, Bi2O3 and Ta2O5 powders, calcining, sintering and sintering. The pre-sintering and sintering temperatures range from 900 to 1000 ° C and from 1000 to 1400 ° C, respectively. The amorphous strontium bismuth tantalate film is prepared by pulsed excimer laser deposition technology and annealed in oxygen atmosphere to obtain the strontium bismuth tantalate thin film. (008) and (115) are the main orientations of the strontium bismuth tantalate films. The TEM analysis shows that the strontium bismuth tantalate films have a sharp grain boundary and a compact structure with an average grain size of about 20 nm. The interface of the films is clear and steep , The thickness is about 200nm.