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为了满足设计和生产多层膜系时精确确定薄膜材料光学常数的需要,建立一种基于透射率光谱包络来获取弱吸收光学薄膜光学常数的均匀模型。为消除基底背面反射对光学薄膜光谱性能测量的影响,给出一种非破坏性的薄膜光学特性校正方法,校正实测光谱数据获得光学薄膜的单面光谱,并给出确定基底光学常数的方法。研究钼舟热蒸发工艺制备的沉积在CaF2基底上的LaF3薄膜样品,并获得了刚沉积的和紫外照射处理40 min后的LaF3薄膜以及CaF2基底在160～340 nm的光学常数。结果表明,紫外照射处理可以提高LaF3薄膜的光学特性(增加折射率和降低消光系数),并降低LaF3薄膜的物理厚度。
In order to meet the need of accurately determining the optical constants of thin films when designing and manufacturing multilayer films, a uniform model based on transmittance spectral envelope for obtaining the optical constants of weakly absorbing optical films was established. In order to eliminate the influence of substrate back reflection on the measurement of optical properties of optical thin films, a non-destructive method for correcting optical properties of thin films was proposed. The single-sided optical spectra of optical thin films were obtained by calibrating the measured data. LaF3 thin films deposited on molybdenum boat thermal evaporation process and deposited on CaF2 substrates were investigated. The optical constants of LaF3 thin films and CaF2 substrates at 160 ~ 340 nm were obtained after 40 min deposition and UV irradiation respectively. The results show that UV irradiation can improve the optical properties of LaF3 films (increase the refractive index and decrease the extinction coefficient) and decrease the physical thickness of LaF3 films.