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采用集成电路工艺模拟软件ＳＳＵＰＲＥＭ４ 模拟了氧化、扩散工艺， 并同实验值进行了比较，模拟值和实验值的偏差在１０％ 以内。与集成电路器件模拟软件Ｓ－ＰＩＳＣＥＳ联用模拟了ＳＳＵＰＲＥＭ４ 的全工序， 并把它应用于实际生产。结果表明ＳＳＵＰＲＥＭ ４ 有较大应用价值
The process of oxidation and diffusion was simulated by using integrated circuit process simulation software SSUPREM4, and compared with the experimental values. The deviation between the simulated value and the experimental value was less than 10%. Combined with S-PISCES, an integrated circuit device simulation software simulates the entire process of SSUPREM4 and applies it to actual production. The results show that SSUPREM 4 has great application value