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利用微波等离子体化学气相沉积(MPCVD)方法,在不锈钢衬底上直接沉积碳纳米管膜。研究碳纳米管膜在放电过程中对其场发射性能的影响。通过XPS、Raman光谱等手段,分析碳纳米管膜在放电过程中sp2碳和sp3碳含量的变化,对碳纳米管膜场发射性能变化的根源进行研究。结果显示,在放电过程中,碳纳米管膜中sp2碳的含量减少,场发射性能变差。经过分析,我们认为发生这种现象的原因是:发射电子主要是从sp2碳发出的,sp2碳的减少直接影响了发射电子的减少,故其场发射性能降低。
Carbon nanotube films were directly deposited on stainless steel substrates by microwave plasma chemical vapor deposition (MPCVD). The effect of carbon nanotube film on its field emission performance during discharge was investigated. By XPS, Raman spectroscopy and other means, analysis of carbon nanotubes film during discharge sp2 carbon and sp3 carbon content changes, the carbon nanotube film field emission properties of the root causes. The results show that the content of sp2 carbon in the carbon nanotube film decreases and the field emission performance deteriorates during the discharge process. After analysis, we think the reason for this phenomenon is that the emitted electrons are mainly emitted from sp2 carbon, and the decrease of sp2 carbon directly affects the reduction of the emitted electrons, so the field emission performance is reduced.