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红外减反射保护膜具有特定的厚度要求,如能进一步减小无氢类金刚石膜(DLC)的光学吸收,就能使其在较大厚度时不过分损失光通量而得以广泛应用。从这点来讲,无氢类金刚石膜是一种极具开发潜力的材料。本文采用非平衡磁控溅射技术(UBMS)制备了无氢类金刚石膜,并研究了其厚度均匀性。研究结果表明:该非平衡磁控溅射装置有能力获得大于Φ150mm的均匀性范围。对DLC膜红外透射谱的分析表明,分别在Si和Ge基底表面单面制备的DLC薄膜,其峰值透射率在波数2983/cm时分别为68.83%和63.05%,这一结果接近无吸收碳材料理论上所能达到的值。同时,在5000到800/cm范围内,未发现明显的吸收峰。这些优良的光学特性表明,采用非平衡磁控溅射技术制备的无氢DLC膜可以作为窗口的红外增透保护膜使用。
Infrared anti-reflection protective film has a certain thickness requirements, such as to be able to further reduce the optical absorption of a non-hydrogen-based diamond-like carbon film (DLC), it can be larger in thickness without loss of flux loss is widely used. From this point of view, hydrogen-free diamond-like carbon film is a very promising material. In this paper, a hydrogen-free diamond-like carbon film was prepared by unbalanced magnetron sputtering (UBMS) and its thickness uniformity was studied. The results show that the unbalanced magnetron sputtering device has the ability to obtain the uniformity range of more than Φ150mm. The DLC film infrared transmission spectrum analysis showed that the DLC film prepared on the single side of Si and Ge substrate surface respectively has a peak transmittance of 68.83% and 63.05% at a wave number of 2983 / cm, which is close to that of the non-absorbent carbon material Theoretically achievable value. Meanwhile, in the range of 5000 to 800 / cm, no obvious absorption peak was found. These excellent optical properties show that the hydrogen-free DLC film prepared by using unbalanced magnetron sputtering technology can be used as a window infrared anti-reflective coating.