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本文首先叙述冷却基片的各种方法。然后介绍LK—2型离子束蚀刻机所采用的半导体致冷器冷却基片的方法。在典型的工作条件下,对半导体致冷器冷却效果进行了测量,根据基片的温升曲线、表明采用半导体致冷器冷却基片是一个有效方法。
This article first describes the various methods of cooling the substrate. Then introduced the LK-2 ion beam etching machine used in the semiconductor cooler cooling substrate method. Under typical operating conditions, the cooling effect of the semiconductor cooler is measured. According to the temperature rise curve of the substrate, it is indicated that the semiconductor cooler is an effective method for cooling the substrate.