报道了一种新的金刚石薄膜选择生长图形化技术。首先用直流偏压增强的微波等离子体化学气相沉积（ＭＰＣＶＤ）对图形区域（Ｓｉ）高密度金刚石成核，接着对掩模区域（ＳｉＯ２）进行一次化学浅腐蚀，然后正常生长金刚石薄膜，得到表面光滑、侧壁陡直的金刚石精细图形。用该技术制作了金刚石微马达结构，其厚度为２μｍ，转子直径１５０μｍ。图形间隙可控制至１－２μｍ。 Reported a new diamond thin film selective growth graph technology. First, the patterned area (Si) high density diamond was nucleated with DC bias enhanced microwave plasma chemical vapor deposition (MPCVD), followed by a chemical shallow etching of the mask area (SiO2), followed by normal growth of the diamond film to give a surface Smooth, steep diamond side wall fine graphics. Using this technique, a diamond micromotor structure was fabricated with a thickness of 2 μm and a rotor diameter of 150 μm. Graphic gap can be controlled to 1-2μm.