研究了Ａｌ含量对（Ｔｉ，Ａｌ）Ｎ薄膜微观结构与性能的影响．实验结果表明：同ＴｉＮ薄膜相同，在（Ｔｉ，Ａｌ）Ｎ系薄膜中存在着（１１１）、（２００）和（２２０）三种择优取向。随着Ａｌ含量的增加这三种取向的衍射强度呈不同的变化趋势，而这三种取向的面间距则都呈先降后升的趋势，利用上述微观结构的变化可合理地解释（Ｔｉ，Ａｌ）Ｎ薄膜的硬度随Ａｌ含量的增加呈先升后降的现象 The effects of Al content on the microstructure and properties of (Ti, Al) N thin films were investigated. The experimental results show that there are three preferred orientations of (111), (200) and (220) in the (Ti, Al) N thin films. With the increase of Al content, the diffraction intensities of the three orientations show different trends, and the interplanar spacings of the three orientations all tend to decrease first and then increase. It can be reasonably explained by the changes of the above microstructures (Ti, Al) N thin film hardness increases with the increase of Al was first increased and then decreased phenomenon