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研究了国产SY－1型CR－39记录加速器加速的高注量的He(++)和H+的蚀刻特性。对幅照过程中靶室内的环境本底做了观察实验。结果表明，在靶室内直接照射束斑位置以外远至40mm处仍能记录到与束斑处相同的离子。而且在高注量离子的束斑区蚀刻后几乎辨不出径迹。进行了刻度实验，给出了CR－39记录不同能量的He(++)和H+的径迹直径响应蚀刻曲线。对高注量束斑区蚀刻后再注人新离子的实验表明记录特性不改变。
The etching characteristics of He (++) and H + accelerated by a domestic SY-1 CR-39 recording accelerator were investigated. Observations of the environmental background in the target chamber during the irradiation were made. The results showed that the same ions at the beam spot could still be recorded as far as 40 mm away from the spot position in the target chamber. And in the high-flux ion beam spot area almost can not distinguish track after etching. A scale experiment was carried out and the track diameter response etching curve of He (++) and H + with different energy recorded by CR-39 was given. Experiments on the injection of new ions after high spot beam spot etching showed no change in recording properties.