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研究了在不同基体上用射频 ＰＣＶＤ方法沉积的 ＢＮ膜结果表明，镀层中的 Ｃ-ＢＮ含量、残余应力、镀层硬度基本上不受基体种类的影响，但沉积速度、膜基结合力却有较大差别镀层由 ａ－ＢＮ和 ｃ-ＢＮ组成， ｃ-ＢＮ的尺寸为 ２０～４０ｎｍ．镀层的硬度为 ＨＶ３０００，残余应力为 ７．０ＧＰａ．
The results of BN film deposited by radio frequency PCVD on different substrates show that the C-BN content, residual stress and hardness of the coating are not affected by the type of matrix, but the deposition rate and the bonding strength of the film are more The large difference coating is composed of a-BN and c-BN, and the size of c-BN is 20 to 40 nm. The hardness of the coating is HV3000 and the residual stress is 7.0 GPa.