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近年来半导体集成电路的高集成化取得明显进展.在1cm~2内具有900万个元件的4MDRAM已进入批量生产.因此,许多超净室都要对应亚微米的要求提高净化技术.半导体集成电路由于杂质污染会造成废品或降低可靠性.例如,电路走线宽为1.5～2μm级的集成电路,75%的废品都是由于进入杂质而引起.只要有走线宽度1/10大小的杂质进入,便会引起缺陷.4M DRAM的线宽最小达0.8μm,因此需要建立控制0.1μm以下超微粒子的技术.本文就是介绍最小走线宽度在
In recent years, remarkable progress has been made in the highly integrated semiconductor integrated circuits, and 4M DRAMs with 9 million elements in 1cm2 have been put into mass production, so many cleanrooms have to respond to submicron demands for improved purification technology. Semiconductor integrated circuits For example, ICs with circuit traces of 1.5-2μm in width and 75% of waste products are caused by impurities, as long as there is an impurity of 1/10 of the trace width , Will cause defects .4M DRAM line width as small as 0.8μm, the need to establish the control of ultrafine particles below 0.1μm technology.This article is to introduce the minimum trace width