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等离子体源离子注入(PSII)是一种新的离子注入技术。该技术与其它相关技术的结合又扩大了其应用。介绍国内首次研制成功的多功能PSI工业样机的结构、性能、参数以及材料改性的初步结果。
Plasma Source Ion Implantation (PSII) is a new ion implantation technique. The combination of this technology with other related technologies expands its application. The structure, performance, parameters and preliminary results of material modification of multifunctional PSI industrial prototype successfully developed in China for the first time are introduced.