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简要介绍化学气相沉积 (CVD)技术的一般原理 ,评述CVD在贵金属铱涂层和薄膜制备方面的应用状况 ,主要包括 :①制备石墨和难熔金属的铱保护涂层 ;②在石墨和陶瓷基体上沉积铱薄膜
The general principles of chemical vapor deposition (CVD) technology are briefly introduced. The application of CVD in the preparation of noble metal iridium coatings and thin films is reviewed. The main applications include: (1) Preparation of iridium protective coatings of graphite and refractory metals; (2) On the deposition of iridium film