论文部分内容阅读
采用射频磁控溅射法在有机薄膜衬底和 70 5 9玻璃衬底上在室温下制备出了因淀积时间变化而厚度不同的ZnO :Al透明导电膜 ,并对不同厚度薄膜的结构特性、表面形貌和光电特性进行了比较研究 .铝掺杂的氧化锌薄膜是多晶膜具有六角纤锌矿结构 ,最佳取向为 (0 0 2 )方向 .淀积时间为 3 0分钟的薄膜具有最低的电阻率 ,分别为 2 .5 5× 1 0 3Ω·cm和 1 .89× 1 0 3Ω·cm ,在可见光区的平均透过率分别达到了 80 %和 85 %以上 .
The ZnO: Al transparent conductive films with different thicknesses due to the variation of deposition time were prepared by RF magnetron sputtering on organic thin film substrates and 70 5 9 glass substrates at room temperature. The structural characteristics of films with different thickness , Surface morphology and photoelectric properties were compared.Aluminum-doped zinc oxide thin film is polycrystalline film hexagonal wurtzite structure, the best orientation (0 0 2) direction deposition time of 30 minutes of the film With the lowest resistivity of 2.55 × 10 3 Ω · cm and 1.89 × 10 3 Ω · cm, respectively. The average transmittance in the visible region reached 80% and 85% respectively.