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本文建立了毛细模型,采用微流动两相流水平集法计算了熔融态硅液与壁面的润湿角,以人造金刚石作为壁面材料的计算结果与实验结果进行比较,验证了该模型和计算方法的正确性.在此基础上,分别选用碳化硅、石墨和人造金刚石作为壁面材料,探讨了不同壁面材料表面张力和壁面黏附力对润湿角的影响规律.结果发现,相同温度下的毛细力作用使得熔融硅液出现起伏上升现象;润湿角均有不同程度的减小然后增大,最终趋于稳定;初始阶段,由于气/熔融硅液表面张力与气/壁面表面张力之差变化较大,液面起伏波动较大;随后趋于稳定上升.同时发现石墨作为壁面材料时,以上变化更易趋于稳定.该研究为熔体中生长晶体硅获得更稳定的生长环境提供了理论依据.
In this paper, a capillary model was established, and the wetting angle of the molten silicon liquid and the wall surface was calculated by the horizontal flow method of two-phase microfluid. The calculated results and the experimental results of synthetic diamond as the wall material were compared. The model and the calculation method On the basis of which, the influences of surface tension and wall adhesion of different wall materials on the wetting angle were investigated using silicon carbide, graphite and synthetic diamond as the wall materials respectively.The results showed that the capillary force at the same temperature The results showed that the molten silicon had a rising and falling phenomenon. The wetting angle decreased and then increased to some extent, and eventually stabilized. In the initial stage, the difference between the surface tension of gas / molten silicon and the surface tension of gas / The fluctuation of liquid surface is large and then tends to rise steadily.When graphite is used as the wall material, the above changes tend to be stable more easily.The research provides a theoretical basis for obtaining more stable growth environment of crystalline silicon in melt.