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由于近代科学技术的发展,以真空为基础的物理工艺过程愈来愈多,这就不可避免的要求对真空容器内的残余气体进行分析并测量其分压强,以便对有关的真空过程进行深入研究,对产品质量作严格的控制。例如,气体放电中,微量杂质气体将导致放电特点的改变;电子管内残余气体成份直接关系到电子管的质量和寿命;真空涂复过程中材料纯度及残余气体成份直接影响复层质量,又如核裂变过程、真空烘干脱水处理过程都希望能很好地控制真空容器内的气体成份。真空物理、工艺的进一步发展又要求更高的真空。目前小的实验系统可获得10~(-12)乇的真空度较大的金属系统获得10~(-10)乇的真空也做得到。在获得这样的超高真空过程中,常常需要知道系统中最后残存
Due to the development of modern science and technology, more and more vacuum-based physical processes inevitably require the analysis of the residual gas in the vacuum container and the measurement of its partial pressure in order to conduct an in-depth study on the vacuum process involved , Strict control of product quality. For example, in the gas discharge, a trace amount of impurity gas will result in the change of the discharge characteristics; the residual gas composition in the electron tube is directly related to the quality and life of the electron tube; the material purity and the residual gas composition in the vacuum coating process directly affect the quality of the cladding; Fission process, vacuum drying dehydration process all hope that good control of the gas content of the vacuum vessel. Vacuum physics, the further development of the process requires a higher vacuum. In the present small experimental system, it is also possible to obtain a vacuum of about 10 to about -12 Torr and a vacuum of about 10 to about 10 Torr. In obtaining such ultra-high vacuum, it is often necessary to know the last remaining in the system