采用直流磁控溅射方法制备了一维二组元Cu/Ti周期超晶格金属薄膜 ,研究了基片温度、膜周期数、基片取向与紫外反射的关系。当基片加热温度为 470℃时 ,在硅 (10 0 )晶面上生长的 30层Cu/Ti膜 ,层间膜厚控制在1∶3、膜总厚度控制为 30 0nm时 ,所制备的超晶格薄膜在 5°入射角下对 2 0 0nm的紫外光 ,其反射率可高达 90 %。 One-dimensional two-component Cu / Ti periodic superlattice metal thin films were prepared by DC magnetron sputtering. The relationship between substrate temperature, film period, substrate orientation and UV reflection was studied. When the substrate was heated at 470 ℃, 30 layers of Cu / Ti films grown on the silicon (10 0) crystal plane were controlled at 1: 3 and the total film thickness was controlled at 30 0 nm The superlattice film has a reflectivity of up to 90% at 200 nm for UV light at an incident angle of 5 °.