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Nitridation of Ti substrate surface using laterally-long Ar/N2 loop type of inductively coupled ther
[会议论文] 作者：Tsuchiya,Mai Kai Suan Tial,Yasunori Tanaka,Yoshihiko Uesugi,Tatsuo Ishijima,Tetsuya Yukimoto,Hiroshi Kawaura,
来源：13th Asia-Pacific Conference on Plasma Science and Technolog 年份：2016
The authors have so far developed a loop type of inductively coupled thermal plasma(Ioop-ICTP) for large-area thermal plasma materials processings.Previously,we found that the Ioop-ICTP could be forme...
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