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Reduction of global warming gas emission during silicon nitride etching by using C3F6/O2 gas chemist
[会议论文] 作者:I. J. Kim,J. H. Lee,S. H. Cho,N.-E. Lee,
来源:2011年第三届微电子及等离子体技术国际会议 年份:2011
Global warming gas emission such as perfluorocarbon compounds (PFCs) has been an issue in the semiconductor and display industries due to their large global warming potentials (GWPS)....
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