搜索筛选:
搜索耗时3.4724秒,为你在为你在102,285,761篇论文里面共找到 1 篇相符的论文内容
发布年度:
Reduction of global warming gas emission during silicon nitride etching by using C3F6/O2 gas chemist
[会议论文] 作者：I. J. Kim,J. H. Lee,S. H. Cho,N.-E. Lee,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Global warming gas emission such as perfluorocarbon compounds (PFCs) has been an issue in the semiconductor and display industries due to their large global warming potentials (GWPS)....
相关搜索：
