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[期刊论文] 作者：Rachid Amrani,Frederic Pichot,,
来源：晶体结构理论与应用(英文) 年份：2012
The Plasma-Enhanced Chemical Vapor Deposition (PECVD) method is widely used compared to other methods to deposit hydrogenated silicon Si:H. In this work, a syst...
[期刊论文] 作者：Rachid Amrani,Pascale Abboud,L,
来源：晶体结构理论与应用(英文) 年份：2012
In order to contribute to the understanding of the optoelectronics properties of hydrogenated nanocrystalline silicon thin films, a detailed study has been cond...
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